Comment on Imec demonstrates electrical yield for 20nm lines High NA EUV single patterningparentComments−blackeyeblitzar1ySo is there any objective way to compare one company’s claims or capabilities against another?−jupp0r1yHere is an amazing discussion of that problem and a description of several metrics that answer your question: https://spectrum.ieee.org/amp/a-better-way-to-measure-progre...−brennanpeterson1yThe sram density is a pretty good equivalent. You can arguably do the average of sram and some logic.If you take the square root of that...you pretty much end up with (modulo a linear scale) the existing nodes.That gets you size. You then need power and speed, which are a bit trickier to compare without a standard/reference device.
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So is there any objective way to compare one company’s claims or capabilities against another?
Here is an amazing discussion of that problem and a description of several metrics that answer your question: https://spectrum.ieee.org/amp/a-better-way-to-measure-progre...
The sram density is a pretty good equivalent. You can arguably do the average of sram and some logic.
If you take the square root of that...you pretty much end up with (modulo a linear scale) the existing nodes.
That gets you size. You then need power and speed, which are a bit trickier to compare without a standard/reference device.