Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography produce around 7 orders of magnitude more power than the most powerful sources based on high harmonic generation.
The wave length and pulse length aren't the same thing though. The short pulsed lasers actually consists of light that have many different wave lengths in them!
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Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography produce around 7 orders of magnitude more power than the most powerful sources based on high harmonic generation.
I was thinking along the lines of: 1 attosecond corresponds to .3nm, so very short wavelength, so very deep UV.
The wave length and pulse length aren't the same thing though. The short pulsed lasers actually consists of light that have many different wave lengths in them!
Yes, but shouldn't there be a peak in the spectrum near the frequency corresponding to the pulselength?